Methods for solving Maxwell's equations are integral part of optical metrology and computational lithography setups. Applications require accurate geometrical resolution, high numerical accuracy and/or low computation times. We present a finite-element based electromagnetic field solver relying on unstructured 3D meshes and adaptive hp-refinement. We apply the method for simulating light scattering off arrays of high aspect-ratio nano-posts and FinFETs.
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Scatterometry,optical metrology,computational metrology,computational lithography,3D rigorous electromagnetic field simulations,finite-element methods,hp-FEM
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