Though optimization softwares are commonly used in visible optical design, none seems to exist for soft x-ray optics. It is shown here that optimization techniques can be applied with some advantages to X-UV monochromator design. A merit function, suitable for minimizing the aberrations is proposed, and the general method of computation is described. Samples of the software inputs and outputs are presented, and compared to reference data. As an example of application to soft X-ray monochromator design, the optimization of the soft X-ray monochromator of the ESRF microscopy beamline is presented. Good agreement between the predicted resolution of a modified PGM monochromator and experimental measurements is reported.
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