Point Diffraction Interferometry at EUV Wavelengths

K. A. Goldberg,R. Beguiristain,J. Bokor,H. Medecki,K. Jackson,D. T. Attwood,G. E. Sommargren,J. P. Spallas,R. Hostetler

Extreme Ultraviolet Lithography（1994）

被引用27|浏览6

摘要

Point diffraction interferometry is a common-path technique that is suitable for at-wavelength testing of EUV lithography optics. We have constructed and successfully tested such a device at the Advanced Light Source at Lawrence Berkeley Laboratory. Preliminary results on the characterization of the wavefront produced by a Fresnel zone plate lens are presented. Reference wavefront quality and thermal effects are also discussed.

更多

查看译文

上传PDF