121301 Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process (52 pages)Riikka L Puurunen,Thomas Schoedl,Ulrich T Schwarz,Volker Kummler,Michael Furitsch,Andreas Leber,Andreas Miler,Alfred Lell,V Harle,B S Ryvkin, E A Avrutin,L Schrottke, Shihlien Lu,Rudolf Hey,M Giehler,H Kostial, H T Grahn,E Dupont,M Byloos,T Oogarah,I Sproule, H C Liu, Yuen Lu,Ruwen Peng, Zheng Wang, Zhenhong Tang, Xiuqi Huang,Mu Wang, Y L Qiu,Alan J Hu,Shih Sheng Jiang,Donghai Feng,Sergey L Rumyantsev, Stanley A Sawyer, M S Shur,Nezih Pala,Xiao Hu,A V Lunev, J S Deng,R Gaskamag（2005）被引用3678|浏览21关键词surface chemistry上传PDF分享引用加入学术空间AI Read Science数据免责声明页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果，我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问，可以通过电子邮件方式联系我们：report@aminer.cnChat Paper正在生成论文摘要
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