Received October 11, 2005; accepted November 10, 2005; posted December 2, 2005 (Doc. ID 65234) We have measured a contrast of 6.5 x 10(-8) from 10 to 25 lambda/D in visible light on the Extreme Adaptive Optics testbed, using a shaped pupil for diffraction suppression. The testbed was designed with a minimal number of high-quality optics to ensure low wavefront error and uses a phase-shifting diffraction interferometer for metrology. This level of contrast is within the regime needed for imaging young Jupiter-like planets, a primary application of high-contrast imaging. We have concluded that wavefront error, not pupil quality, is the limiting error source for improved contrast in our system.

As adaptive optics (AO) matures, it becomes possible to envision AO systems oriented towards specific important scientific goals rather than general-purpose systems. One such goal for the next decade is the direct imaging detection of extrasolar planets. An "extreme" adaptive optics (ExAO) system optimized for extrasolar planet detection will have very high actuator counts and rapid update rates designed for observations of bright stars and will require exquisite internal calibration at the nanometer level. In addition to extrasolar planet detection, such a system will be capable of characterizing dust disks around young or mature stars, outflows from evolved stars, and high Strehl ratio imaging even at visible wavelengths. The NSF Center for Adaptive Optics has carried out a detailed conceptual design study for such an instrument, dubbed the eXtreme Adaptive Optics Planet Imager or XAOPI. XAOPI is a 4096-actuator AO system, notionally for the Keck telescope, capable of achieving contrast ratios >10 at angular separations of 0.2-1". ExAO system performance analysis is quite different than conventional AO systems the spatial and temporal frequency content of wavefront error sources is as critical as their magnitude. We present here an overview of the XAOPI project, and an error budget highlighting the key areas determining achievable contrast. The most challenging requirement is for residual static errors to be less than 2 nm over the controlled range of spatial frequencies. If this can be achieved, direct imaging of extrasolar planets will be feasible within this decade.

The azimuthal Zernike coefficients for shells of Zernike functions with shell numbers n<N may be determined by making measurements at N equally spaced rotational positions. However, these measurements do not determine the coefficients of any of the purely radial Zernike functions. Label the circle that the azimuthal Zernikes are measured in as circle A. Suppose that the azimuthal Zernike coefficients for n<N are also measured in a smaller circle B which is inside circle A but offset so that it is tangent to circle A and so that it has the center of circle A just inside its circular boundary. The diameter of circle B is thus only slightly larger than half the diameter of circle A. From these two sets of measurements, all the Zernike coefficients may be determined for n<N. However, there are usually unknown small rigid body motions of the optic between measurements. Then all the Zernike coefficients for n<N except for piston, tilts, and focus may be determined. We describe the exact mathematical algorithm that does this and describe an interferometer which measures the complete wavefront from pinholes in pinhole aligners. These pinhole aligners are self-contained units which include a fiber optic, focusing optics, and a "pinhole mirror". These pinhole aligners can then be used in another interferometer so that its errors would then be known. Physically, the measurements in circles A and B are accomplished by rotating each pinhole aligner about an aligned axis, then about an oblique axis. Absolute measurement accuracies better than 0.2 nm were achieved.

Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conducted at Lawrence Berkeley National Laboratory (LBNL) and Lawrence Livermore National Laboratory (LLNL), has produced the highest resolution optical systems ever made. We have pioneered the development of ultra-high-accuracy optical testing and alignment methods, working at extreme ultraviolet wavelengths, and pushing wavefront-measuring interferometry into the 2-20-nm wavelength range (60-600 eV). These coherent measurement techniques, including lateral shearing interferometry and phase-shifting point-diffraction interferometry (PS/PDI) have achieved RMS wavefront measurement accuracies of 0.5-1-Å and better for primary aberration terms, enabling the creation of diffraction-limited EUV optics. The measurement accuracy is established using careful null-testing procedures, and has been verified repeatedly through high-resolution imaging. We believe these methods are broadly applicable to the advancement of short-wavelength optical systems including space telescopes, microscope objectives, projection lenses, synchrotron beamline optics, diffractive and holographic optics, and more. Measurements have been performed on a tunable undulator beamline at LBNL's Advanced Light Source (ALS), optimized for high coherent flux; although many of these techniques should be adaptable to alternative ultraviolet, EUV, and soft x-ray light sources. To date, we have measured nine prototype all-reflective EUV optical systems with NA values between 0.08 and 0.30 (f/6.25 to f/1.67). These projection-imaging lenses were created for the semiconductor industry's advanced research in EUV photolithography, a technology slated for introduction in 2009-13. This paper reviews the methods used and our program's accomplishments to date.

Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conducted at Lawrence Berkeley National Laboratory (LBNL) and Lawrence Livermore National Laboratory (LLNL), has produced the highest resolution optical systems ever made. We have pioneered the development of ultra-high-accuracy optical testing and alignment methods, working at extreme ultraviolet wavelengths, and pushing wavefront-measuring interferometry into the 2–20-nm wavelength range (60–600 eV). These coherent measurement techniques, including lateral shearing interferometry and phase-shifting point-diffraction interferometry (PS/PDI) have achieved RMS wavefront measurement accuracies of 0.5–1-Å and better for primary aberration terms, enabling the creation of diffraction-limited EUV optics. The measurement accuracy is established using careful null-testing procedures, and has been verified repeatedly through high-resolution imaging. We believe these methods are broadly applicable to the advancement of short-wavelength optical systems including space telescopes, microscope objectives, projection lenses, synchrotron beamline optics, diffractive and holographic optics, and more. Measurements have been performed on a tunable undulator beamline at LBNL’s Advanced Light Source (ALS), optimized for high coherent flux; although many of these techniques should be adaptable to alternative ultraviolet, EUV, and soft x-ray light sources. To date, we have measured nine prototype all-reflective EUV optical systems with NA values between 0.08 and 0.30 (ƒ/6.25 to ƒ/1.67). These projection-imaging lenses were created for the semiconductor industry’s advanced research in EUV photolithography, a technology slated for introduction in 2009–13. This paper reviews the methods used and our program’s accomplishments to date.

We have built and calibrated a set of 532-nm wavelength wavefront reference sources that fill a numerical aperture of 0.3. Early data show that they have a measured departure from sphericity of less than 0.2 nm RMS (0.4 milliwaves) and a reproducibility of better than 0.05 nm rms. These devices are compact, portable, fiber-fed, and are intended as sources of measurement and reference waves in wavefront measuring interferometers used for metrology of EUVL optical elements and systems. Keys to wave front accuracy include fabrication of an 800-nm pinhole in a smooth reflecting surface as well as a calibration procedure capable of measuring axisymmetric and non-axisymmetric errors.

"Extreme" adaptive optics systems are optimized for ultra-high contrast applications, such as ground-based extrasolar planet detection. The Extreme Adaptive Optics Testbed at UC Santa Cruz is being used to investigate and develop technologies for high-contrast imaging, especially wavefront control. We use a simple optical design to minimize wavefront error and maximize the experimentally achievable contrast. A phase shifting diffraction interferometer (PSDI) measures wavefront errors with sub-nm precision and accuracy for metrology and wavefront control. Previously, we have demonstrated RMS wavefront errors of <1.5 nm and a contrast of >107 over a substantial region using a shaped pupil without a deformable mirror. Current work includes the installation and characterization of a 1024-actuator Micro-Electro-Mechanical-Systems (MEMS) deformable mirror, manufactured by Boston Micro-Machines for active wavefront control. Using the PSDI as the wavefront sensor we have flattened the deformable mirror to <1 nm within the controllable spatial frequencies and measured a contrast in the far field of >106. Consistent flattening required testing and characterization of the individual actuator response, including the effects of dead and low-response actuators. Stability and repeatability of the MEMS devices was also tested. Ultimately this testbed will be used to test all aspects of the system architecture for an extrasolar planet-finding AO system.

As adaptive optics (AO) matures, it becomes possible to envision AO systems oriented towards specific important scientific goals rather than general-purpose systems. One such goal for the next decade is the direct imaging detection of extrasolar planets. An "extreme" adaptive optics (ExAO) system optimized for extrasolar planet detection will have very high actuator counts and rapid update rates - designed for observations of bright stars - and will require exquisite internal calibration at the nanometer level. In addition to extrasolar planet detection, such a system will be capable of characterizing dust disks around young or mature stars, outflows from evolved stars, and high Strehl ratio imaging even at visible wavelengths. The NSF Center for Adaptive Optics has carried out a detailed conceptual design study for such an instrument, dubbed the eXtreme Adaptive Optics Planet Imager or XAOPI. XAOPI is a 4096-actuator AO system, notionally for the Keck telescope, capable of achieving contrast ratios >107 at angular separations of 0.2-1". ExAO system performance analysis is quite different than conventional AO systems - the spatial and temporal frequency content of wavefront error sources is as critical as their magnitude. We present here an overview of the XAOPI project, and an error budget highlighting the key areas determining achievable contrast. The most challenging requirement is for residual static errors to be less than 2 nm over the controlled range of spatial frequencies. If this can be achieved, direct imaging of extrasolar planets will be feasible within this decade.

The success of recent static printing experiments at Lawrence Berkeley National Laboratory's Advanced Light Source (ALS) using the EUV LLC Engineering Test Stand (ETS) Set-2 optic has demonstrated the utility of synchrotron-based EUV exposure stations. Although not viable light sources for commercial lithography, synchrotrons provide clean, convenient. and extremely flexible sources for developmental microfield lithography. The great flexibility of synchrotron-based illumination arises from the fact that such sources facilitate active coherence reduction, thus enabling the coherence function, or pupil fill, to be actively sculpted in real time.As the commercialization of EUV progresses, the focus of developmental EUV lithography is shifting from low numerical aperture (NA) tools such as the 0.1-NA ETS to higher-NA tools such as the 0.3-NA Micro Exposure Tool (MET). To support printing with MET optics at the ALS. a new printing station has been developed, relying on a scanning illuminator to provide programmable coherence (pupil-fill) control. The illuminator is designed to operate up to a coherence factor (a) of 1 and support the full 200x600 design printed field of view. In addition to a new illuminator design. new focus sensing and dose-control systems have also been implemented. Here we describe the MET printing capabilities in detail and present preliminary printing results with the Sematech Set-2 MET optic.

"Extreme" adaptive optics systems are optimized for ultra-high-contrast applications, such as ground-based extrasolar planet detection. The Extreme Adaptive Optics Testbed at UC Santa Cruz is being used to investigate and develop technologies for high-contrast imaging, especially wavefront control. A simple optical design allows us to minimize wavefront error and maximize the experimentally achievable contrast before progressing to a more complex set-up. A phase shifting diffraction interferometer is used to measure wavefront errors with sub-nm precision and accuracy. We have demonstrated RMS wavefront errors of <1.3 nm and a contrast of >10-7 over a substantial region using a shaped pupil. Current work includes the installation and characterization of a 1024-actuator Micro-Electro-Mechanical-Systems (MEMS) deformable mirror, manufactured by Boston Micro-Machines, which will be used for wavefront control. In our initial experiments we can flatten the deformable mirror to 1.8-nm RMS wavefront error within a control radius of 5-13 cycles per aperture. Ultimately this testbed will be used to test all aspects of the system architecture for an extrasolar planet-finding AO system.

We describe a new technical approach for observations of Galactic and extra-Galactic soft X-ray sources with ultra-high angular resolution. The technique is based on the use of recently developed diffraction-limited, normal-incidence mirror substrates and ultra-short-period multilayer coatings, tuned to specific bright emission lines in the range 16 < l < 40 Å, for the construction of a diffraction-limited X-ray telescope. Sub-milliarcsecond resolution could be achieved in a moderately-sized Cassegrain or prime-focus geometry, while resolution of order 0.01 microarcseconds could be achieved using a synthetic aperture X-ray interferometer constructed from an array of such telescopes spread over a 50 km baseline. We describe our technical approach in detail and outline some of the observations that would become possible with the proposed instrumentation.

Ground based adaptive optics is a potentially powerful technique for direct imaging detection of extrasolar planets. Turbulence in the Earth's atmosphere imposes some fundamental limits, but the large size of around-based telescopes compared to spacecraft can work to mitigate this. We are carrying out a design study for a dedicated ultra-high-contrast system, the eXtreme Adaptive Optics Planet Imager (XAOPI), which could be deployed on an 8-10m telescope in 2007. With a 4096-actuator MEMS deformable mirror it should achieve Strehl >0.9 in the near-IR. Using an innovative spatially filtered wavefront sensor, the system will be optimized to control scattered light over a large radius and suppress artifacts caused by static errors. We predict that it will achieve contrast levels of 10(7)-10(8) at angular separations of 0.2-0.8" around a large sample of stars (R<7-10), sufficient to detect Jupiter-like planets through their near-IR emission over a wide range of ages and masses. We are constructing, a high-contrast AO testbed to verify key concepts of our system, and present preliminary results here, showing an RMS wavefront error of <1.3 nm with a flat mirror.

Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP) source, stages, sensors, and control system have been made. The LPP has been upgraded from the 40 W LPP cluster jet source used for initial demonstration of full-field imaging to a high-power (1500 W) LPP source with a liquid Xe spray jet. Scanned lithography at various laser drive powers of >500 W has been demonstrated with virtually identical lithographic performance.

Future extreme ultraviolet lithography (EUVL) steppers will, in all likelihood, have six-mirror projection cameras. To operate at the diffraction limit over an acceptable depth of focus each aspheric mirror will have to be fabricated with an absolute figure accuracy approaching 100pm rms. We are currently developing visible light interferometry to meet this need based on modifications of our present phase shifting diffraction interferometry (PSDI) methodology where we achieved an absolute accuracy of 250pm. The basic PSDI approach has been further simplified, using lensless imaging based on computational diffractive back-propagation, to eliminate auxiliary optics that typically limit measurement accuracy. Small remaining error sources, related to geometric positioning, CCD camera pixel spacing and laser wavelength, have been modeled and measured. Using these results we have estimated the total system error for measuring off-axis aspheric EUVL mirrors with this new approach to interferometry.