Fe- and Mn-doped AlN thin films were prepared on Si substrates by direct current (DC) magnetron co-sputtering method in the atmospher of Ar and N2 mixture. The influences of sputtering currents and the target to substrate distance on the structure of the films were investigated by X-ray diffraction and Raman spectroscopy, respectively. Surface morphology and composition were studied by scanning electron microscope (SEM) with an energy dispersive X-ray spectroscopy (EDS) attachment. The magnetism of Mn- and Fe-doped AlN films was measured by vibrating sample magnetometer (VSM) at room temperature (RT). Processing of the Mn-doped AlN films produces Mn clusters in the samples. Due to the presence of the antiferromagnetism Mn clusters, ferromagnetism is either suppressed or disappears. The Fe-doped AlN films show ferromagnetism at RT, which should arise from the AlFeN ternary alloy. With the increase of the Fe target sputtering current, the Fe concentration is increased from 6.81 at.% to 16.17at.%; the saturation magnetization Ms is reduced from 0.27 emu·cm-3 to 0.20 emu·cm-3, and the coercive force Hc is increased from 57 Oe to 115 Oe, this is because the separation of Fe ions get shorter and the antiferromagnetic coupling is enhanced.

Nano-sheet carbon films(NSCFs) were fabricated on Si wafer chips by means of quartz-tube-type microwave plasma chemical vapour deposition(MWPCVD).In order to further improve the field emission(FE) current density,a 2-nm Ti film was prepared on the samples by using electron beam(EB) evaporation.The FE characteristics of the Ti-coated NSCF were measured in an ultrahigh vacuum system.The FE properties of the NSCF are obviously improved due to its surface modified by titanium carbide after deposition of a thin layer of Ti film.The threshold field is decreased from 2.6 V/μm to 2.0 V/μm and the FE current density at a macroscopic electric field of 9 V/μm is increased from 12.4 mA/cm2 to 20.2 mA/cm2 for Ti-coated nano-sheet carbon films.