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Ming-Ren Lin received the Ph.D. degree in materials science and engineering from Northwestern University in 1984.
He is a Senior Fellow and Director of Technology Research Group, AMD, Sunnyvale, CA. His organizational responsibilities include the Strategic Technology Group, strategic lithography technology, SRC/MARCO program management, and other external research engagements with consortia, institutes, and universities. He joined AMD in 1984 and has since been involved in integrated circuit process research and development on a wide variety of technologies for dynamic RAM, static RAM, nonvolatile memory, and microprocessor products. His group is currently focusing on new transistor architectures and process technologies, advanced lithography technologies, and external research engagements including SRC and MARCO programs for 45-nm technology nodes and beyond. He has authored or coauthored over 75 publications in major technical journals and international conferences and has delivered invited talks to prestigious organizations including MIT, Stanford University, University of California, Berkeley, and ERSO. He holds 65 U.S. patents in advanced devices and interconnects and related technologies
Dr. Lin is a recipient of the AMD Prolific Patent Award. He has served as a member of various technical committees and technical advisory boards for organizations such as the Semiconductor Research Corporation (SRC), Sematech, MARCO, and the Technology Strategic Council (TSC) of the SIA. He is also an officer of IEEE International VLSI Technology Symposium Technical Committee.
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