Thierry Ouisse

Odette Chaix-Pluchery was born in France in 1956. She obtained the Ph.D. degree in physical sciences at the Université de Bourgogne, Dijon, France, in 1986. She is a senior researcher at the Centre National de la Recherche Scientifique (CNRS) in the Laboratoire des Matériaux et du Génie Physique, Grenoble, France. Her research activities are in the fields of materials science and solid state chemistry. They are specifically focused on Raman spectroscopy and X-ray diffraction techniques applied to the analysis of thin film and material structures. Applications range from the reactivity of metal films deposited on Si and SiGe to stress and structure analysis in thin oxide films, in particular, ferroelectric oxides.