基本信息
浏览量:6
职业迁徙
个人简介
暂无内容
研究兴趣
论文共 35 篇作者统计合作学者相似作者
按年份排序按引用量排序主题筛选期刊级别筛选合作者筛选合作机构筛选
时间
引用量
主题
期刊级别
合作者
合作机构
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Changmin Park, Kyoil Koo, Seongtae Jeong,
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 (2023)
Kaushik Sah,Andrew Cross,Sayantan Das, Roberto Fallica,Jeonghoon Lee, Ryan Ryoung Kim,Sandip Halder,Ethan Maguire, Ana-Maria Armeanu, Monica Sears,Neal Lafferty, Vlad Liubich,
International Conference on Extreme Ultraviolet Lithography 2022 (2022)
Kaushik Sah,Sayantan Das,Andrew Cross, Kay Peng,Kha Tran,Binesh Babu, Ardis Liang,Danilo De Simone,Philippe Leray,Sandip Halder
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 1161128
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV (2021): 624-628
Sayantan Das,Kaushik Sah, Ardis Liang,Hemanta Roy,Kha Tran,Binesh Babu, Arjun Hegde,Andrew Cross,Philippe Leray,Sandip Halder
International Conference on Extreme Ultraviolet Lithography 2021 (2021): 82-92
Andrew Cross,Kaushik Sah,Vidyasagar Anantha, Balarka Gupta, Ramon Ynzunza, Neil Troy, Kenong Wu,Raghav Babulnath, Meghna Rajendran, Dieter Van Den Heuvel,Philippe Leray
EXTREME ULTRAVIOLET LITHOGRAPHY 2020 (2020)
加载更多
作者统计
合作学者
合作机构
D-Core
- 合作者
- 学生
- 导师
数据免责声明
页面数据均来自互联网公开来源、合作出版商和通过AI技术自动分析结果,我们不对页面数据的有效性、准确性、正确性、可靠性、完整性和及时性做出任何承诺和保证。若有疑问,可以通过电子邮件方式联系我们:report@aminer.cn