谷歌浏览器插件
订阅小程序
在清言上使用

Electrostatic Rotator For Alignment Purposes In Multi Electron Beam Systems

MICROELECTRONIC ENGINEERING(2010)

引用 2|浏览2
暂无评分
摘要
In single charged particle beam column the alignment is obtained either by mechanical shift of the lenses or by XY alignment deflectors. The problem in multi beam array systems is that it is only possible to deflect the array of beams in the XY direction and not able to correct for a possible rotation errors between arrays blocks. A new concept is presented here that can electro statically align multi beam array systems. (C) 2009 Elsevier B.V. All rights reserved.
更多
查看译文
关键词
Maskless lithography,Multibeam,Adaptive optics,Electron beam lithography,Electron optics
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要