Effect of the charge distribution at the interface on the properties of PZT/SiO2/Si heterostructure

FERROELECTRICS(2011)

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摘要
Asymmetry related to the conduction type of the Si substrate and polarization direction of PZT were found in the polarization-voltage (P-V) loops, capacitance voltage (C-V) curves and resistance of the integrated system. According to the configuration and the characteristic of the integrated structure, we suggest that the space-charge layer in Si and the tunneling process between Si and PZT during the polarization are the main causes for this asymmetry.
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关键词
asymmetry,interface,space-charge layer,tunneling
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