Modelling of Resist Performance

AbstractSimulation of lithographic processes uksing novolac/diazonaphthoquinone resists has become widespread over the past 15 years. Several refinements to the original Dill model have been made to account for experimentally observed behavior. Models have also bee extended to cover other resist chemistry, including electron beam resists, chemically amplified resists and surface‐imaging approaches. While these models are not yet mature, useful insight to the chemical mechanisms and processing can be gained through their use.