Nano-lithography with atoms

The general features of atom lithography, such as parallel deposition, large exposure area, nanometer resolution and both direct writing and resist based patterning, make it a promising field. A summary of the present state of neutral atom lithography is presented. The methods and results from various groups ale discussed. A more in-depth study of three different types of atom lithography undertaken in our group is given. (C) 1999 Elsevier Science B.V. All rights reserved.