Improved structure for optimisation of focus and exposure for IC production

A. J. Walton, M. Fallon,J. T. M. Stevenson,A. W. S. Ross,C. M. Reeves

Electronics Letters（1993）

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摘要

A test structure that can be used for optimising the focus and exposure of wafer steppers is presented. It consists of a single layer of polysilicon which lends itself to automatic electrical measurement and does not suffer from the apex height reduction which occurs with the previously reported Gaudi structure.

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关键词

focusing,integrated circuit manufacture,photolithography,IC production,automatic electrical measurement,exposure,focus,optimisation,wafer steppers

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