Dual-Gate Algan/Gan High-Electron-Mobility Transistors With Short Gate Length For High-Power Mixers

PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3 NO 3(2006)

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摘要
We have fabricated dual-gate AlGaN/GaN high-electron-mobility transistors (HEMTs) with a short gate on SiC substrates for use in high-power mixers and have measured the DC and up-conversion RF characteristics. A device with a T-shaped gate (0.15 mu m x 300 mu m) exhibits a maximum transconductance of 40 mS, an on-state breakdown voltage of over 30 V, and off-state breakdown voltage of 86 V. The maximum RF output power (P-RFout) is 17 dBm, and the up-conversion gain is 7.5 dB at a frequency of 10 GHz when the bias point voltage is 30 V. As the local frequency increases from 2 to 10 GHz, P-RFout and the gain decrease by only 2 and 2.6 dB, respectively. Shortening the gate was found to be effective in improving the frequency characteristics of a mixer at frequencies up to and including the X-band. (c) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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high electron mobility transistor,breakdown voltage
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