HF plasma pencil — new source for plasma surface processing

The high-frequency plasma pencil is a source of a highly active environment (electrons, ions, reactive radicals, excited atoms and molecules), which can be generated at atmospheric, reduced or increased pressure, preserving a broad control of performance. As an active medium flowing through the plasma jet a gas, a liquid as well as a mixture of dispersed particles (powders) can be used. The plasma jet can be controlled like hand-operated tools. Several technological applications have already been used (restoration of archeological glass artifacts, fullerene production, fragmentation of molecules for microelectrophoresis, plasma polymerization in liquids, various plasma surface treatments, etc.). (C) 1999 Elsevier Science S.A. All rights reserved.