Modelling Charge Injection in MOS Analogue Switches Using a Compact Model in a Deep Submicron Technology

Charge injection in MOS switches in a deep submicron technology has been analysed. The analysis has been extended to the general case of including the conduction of the MOS transistor in the moderate and weak inversion regions, using a continuous and physical formulation based on the EKV model. SPICE simulations, based on the BSIM3v3 model, which ensures the charge conservation, have demonstrated the validity of our work.