Patterning of sub-micrometric Co/NiO dots by hot embossing lithography and study of their magnetic properties

J. Grisolia,C. Martin,L. Ressier,F. Carcenac,C. Vieu,J.-F. Bobo,J.-P. Peyrade

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS（2004）

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摘要

Ferromagnetic/antiferromagnetic Co/NiO films were patterned into sub-micrometric dots by hot embossing lithography. The magneto-optical Kerr effect study of these dots shows that when the dot size decreases, the coercive field H-c increases and the exchange bias field H-EB decreases. (C) 2004 Elsevier B.V. All rights reserved.

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关键词

exchange anisotropy,thin film F/AF patterning,hot embossing lithography

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