Electronic-Properties Of Si Atomic-Planar-Doped Gaas/Alas Quantum-Well Structures Grown By Mbe

S Sasa,K Kondo, H Ishikawa,T Fujii, S Muto, S Hiyamizu

Surface Science Letters(1986)

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摘要
Optical and electrical properties of silicon atomic-planar-doped (Si-PD) (GaAs)m/(AlAs)5 rnultiquantura well structures (m = 3–13; 30 periods) were measured to study the energy band structure in ultrathin quantum well layers. Reduction of photoluminescence intensity for m = 3 suggests the conduction band crossover (direct-indirect transition) in the GaAs region.
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quantum well
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