Improved Ion Beam Incident Angle Control For Varian E220 And E500 Implanters

This paper discusses the need and a solution for improved implant angle control required to support advanced device production at 90nm on Varian E220/E500 series ion implanters. The paper characterizes the software and hardware improvements made to the implanter in order to achieve improved control over implant angle. In-situ Therma-wave metrology checks along with split-lot test methodology and device electrical performance results are also characterized.