Phase edge lithography for sub-0. 1um electrical channel length in a 200mm full cmos processP. Agnello,T. Newman,E. Crabbe,S. Subbanna,E. Ganin,L. Liebmann,J. Comfort,D. SunderlandVery Large Scale Integration(1995)引用 25|浏览29暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要