XPS study of the early stages of deposition of Ni, Cu and Pt on HOPG

SURFACE SCIENCE(1997)

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摘要
A comparative XPS investigation of the formation of thin layers of transition metals on graphite (HOPG) was carried out. Deposition was performed by ion sputtering a clean metallic target in the preparation chamber of the spectrometer. The chemical characterization of the interface and the investigation of the growth mechanisms were carried out by examining the binding energies (BE), the full widths at half maximum (FWHM) and the intensities (I) of the XPS core-level spectra of the deposited metals and of the substrate as a function of deposition lime. A BE shift of +0.6 eV accompanied by a FWHM increase of about 0.6 eV of the metallic core-level is observed for the smallest amount of deposited metal for the three metals, The layer thickness at which the BE and FWHM of the deposited metals reach the values of the bulk increases in the order of Cu (8 Angstrom)更多
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关键词
copper,growth mechanism,metal-graphite interface,metallic films,nickel,platinum,sputter deposition,surface reaction,XPS
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