PbTiO3 thin films prepared by metalorganic chemical vapor deposition on LaAlO3

High-quality PbTiO3 thin films have been grown on LaAlO3 substrates by metalorganic chemical vapor deposition, using purified metalorganic precursors titanium-iso-propoxide and tetra-ethyl-lead. The results of the cross-section scanning electron microscopy and x-ray diffraction (XRD), including theta and phi scan, show that the films are epitaxy, and a domains and c domains may align alternately in the thin films. The experiments of high-temperature XRD reveal the nature of the phase transition of grown PbTiO3 thin films from tetragonal to cubic phase. The transition temperature is around 460��C which is far lower than that of bulk PbTiO3 and the thin films deposited on fused quartz substrates. ? 1995 American Institute of Physics.