Silica-supported poly-γ-aminopropylsilane Cu2+-Pd 2+ complex: A new catalyst system for heck vinylation reaction

In this paper, a new silica-supported poly-γ-aminopropylsilane Cu2+-Pd2+ complex was studied in Heck vinylation reaction of aryl iodide with olefins. The catalyst is highly active and stereoselective at 70-100°C, and can be resused after washing without loss in activity.