ZnO quantum dot hybrid luminescent resists for nanoimprint lithography

We report the preparation of ZnO quantum dot hybrid luminescent resists for nanoimprint lithography. Photoluminescence spectra indicate that ZnO QDs@AMONIL have a significant increase in the luminescent intensity, an obvious blue-shift of emission peak and the Stoke's shift, revealing that ZnO QDs@AMONIL have dramatic luminescent property change instead of inhibiting or only preserving the optical properties of pure ZnO QDs. The fabrication of two-dimensional (2D) photonic crystal structure on the ZnO QDs@AMONIL by UV-based nanoimprint lithography is demonstrated at last, which confirms the luminescent ZnO QDs@AMONIL reliable processing capabilities in wavelength-scale and envisions its promising applications in the optoelectronic micro-/nanodevices.