Characteristics of a Novel Poly-Si P-Channel Junctionless Thin-Film Transistor With Hybrid P/N-Substrate

This letter for the first time proposes a hybrid P/N substrate as a poly-Si p-channel for junctionless thin-film transistor (JL-TFT) with nanowires and omega-gate structures. The hybrid P/N JL-TFT exhibits a high ION/IOFF current ratio (>107), a steep subthreshold swing of 64 mV/dec, and a low drain-induced barrier lowering value of 3 mV/V by reducing the effective channel thickness that is caused by the channel/substrate junction. In addition, the series resistance for novel P/N JL-TFT with channel thickness (Tch) of 24 nm is 50 times smaller than conventional JL-TFT with Tch = 12 nm. This hybrid P/N structure can break through the strict limitation of JL-TFT channel thickness.