Ellipsometry for cSiGe metrology

Soha Farhat,Sampath Rangarajan,T J Mcardle,Michael D Steigerwalt,Dawei Hu, Ming Dai

Advanced Semiconductor Manufacturing Conference（2014）

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摘要

In this paper we report the effectiveness of optical ellipsometry in measuring thickness and Germanium % of channel SiGe on SOI substrate used in advanced node high performance semiconductor devices.

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关键词

ge-si alloys,ellipsometry,semiconductor devices,silicon-on-insulator,thickness measurement,soi substrate,sige,advanced node high performance semiconductor devices,optical ellipsometry,ge concentration,thickness,csige,metrology,silicon on insulator

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