Fluorinated ALD Al2O3 Gate Dielectrics by CF4 PlasmaC S Lai, Kung Ming Fan,Yi Jung Chen,K H Su,Changrong Wu,Shian Jyh Lin, Chungyuan Leeieee(2005)引用 1|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要