Nano-scale ablation with a compact extreme ultraviolet laser

C S Menoni,G Vaschenko,Herman Bravo,F Brizuela,Jorge Juan Gabriel Rocca, Wujie Chao,Erik H Anderson,David T Attwood,Oscar Hemberg,B Frazer,S Bloom

Montreal, Que.（2006）

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摘要

In this work we demonstrate the feasibility of directly ablating sub-100 nm holes using the focused extreme ultraviolet (EUV) wavelength output from a compact lambda=46.9 nm capillary discharge laser. These results demonstrate the feasibility of sub-100 nm patterning of materials with a focused extreme ultraviolet laser beam, opening a path for the development of new nanoprobes and nano-machining tools

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关键词

argon,gas lasers,laser ablation,nanopatterning,100 nm,46.9 nm,ar,argon laser,capillary discharge laser,focused extreme ultraviolet laser beam,nanomachining tools,nanoprobes,nanoscale ablation,machine tool,extreme ultraviolet

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