Device-level APC in Ion Implantation for Analog Device

T Kyuho,Tetsuya Tsukihara,Q Wang,Masahiro Yamaoka, Takafumi Motosue,Koji Kimura

Tokyo（2006）

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摘要

With the aim of achieving high accuracy for analog devices, we developed an advanced process control (APC) system for poly silicon resistance control in implantation steps. The effect of this system has been successfully demonstrated in our mass production. Moreover LP-CVD equipment for poly silicon deposition was enhanced with EES. This can improve the equipment fault detection ability for stabilizing this APC system.

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关键词

fault diagnosis,ion implantation,process control,advanced process control,analog device,device-level apc,equipment fault detection ability,mass production,polysilicon resistance control,fault detection

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