Preparation and characterization of SiO2 nano-rods by CVD method

A simple method is presented for the preparation of silica nano-rods. The silica nano-rods with a diameter of about 200 nm with smooth surface were synthesized by chemical vapor deposition method at 1300square. The as-synthesized samples were characterized by means of scanning electron microscopy, energy dispersive x-ray, and transmission electron microscopy. The results show that synthesized silica nano-rods have a uniform size, well-defined shape, and smooth surface. However, the morphologies and microstructures of silica nano-rods are affected by synthesis conditions, such as the synthesis temperature and the vapor concentration of the SiOx. On the basis of these experimental results, a possible growth mechanism of silica nano-rods in this process is proposed.