Flexible InGaN LEDs on a Polyimide Substrate Fabricated Using a Simple Direct-Transfer Method

Photonics Technology Letters, IEEE(2014)

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摘要
An array of InGaN-based flexible light-emitting diodes (FLEDs) was fabricated on a full-scale 2-in polyimide substrate. An InGaN epitaxial layer on a sapphire substrate was directly bonded with a polyimide substrate, and the sapphire substrate was then removed via a laser lift-off process. A subsequent n-GaN etching process for a chip isolation finished LED chips over the entire 2-in polyimide substrate. Using this simple direct-transfer process, we obtained a production yield of over 97%. The FLED device operated linearly up to an input current level of 500 mA. Output power, operating voltage, and wavelength shift of the FLED up to 400-mA driving current were nearly the same as for a vertical LED on metal substrate.
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III-V semiconductors,etching,gallium compounds,indium compounds,laser materials processing,optical fabrication,organic light emitting diodes,polymers,sapphire,semiconductor epitaxial layers,Al2O3,InGaN,current 400 mA,current 500 mA,flexible light-emitting diodes,indium gallium nitride epitaxial layer,indium gallium nitride-based FLED array,laser lift-off process,metal substrate,n-gallium nitride etching process,sapphire substrate,simple direct-transfer method,two-in polyimide substrate,Flexible light emitting diode (FLED),direct transfer method,polyimide substrate
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