Optical and electrical diagnostics on extended Dielectric Barrier Discharge source

Plasma Science(2011)

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摘要
Summary form only given. The DBD (Dielectric Barrier Discharge) is well known for its great advantages in various kinds of industrial applications and has been widely used in manufacturing process including flat panel displays, thin films and semiconductor packaging. There has been enormous progress on DBD source development and diagnostics to suit these different purposes. At the same time, there are increasing needs for moderate and efficient remote plasma sources in order to avoid electrical damage from microarcs or high energy ion collisions. To this end, a stable remote plasma using an extended DBD source having a stable effective discharge area of 550mm × 40mm was investigated. The electron temperature was measured from a Boltzmann plot based a PLTE (Partial Local Thermodynamic Equilibrium) model and electron density measured from linewidth broadening of Hβ line, with hydrogen insertion for comparison of the direct discharge region in between electrodes and the remote plasma region. The capacitance of DBD electrode as well as discharge energy and discharge power has been investigated with V-Q Lissajous analysis. Surface treatment of glass and polypropylene with various applied voltage and gas flow rates were studied. Combining optical and electrical diagnostics and surface analysis results on treated samples, the atmospheric plasma source for in-line processing was characterized.
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关键词
arcs (electric),glass,plasma collision processes,plasma density,plasma diagnostics,plasma instability,plasma materials processing,plasma sources,plasma temperature,plasma thermodynamics,polymers,surface treatment,Boltzmann plot method,Hbeta linewidth broadening,V-Q Lissajous analysis,atmospheric plasma source,dielectric barrier discharge source,direct discharge region,discharge energy,discharge power,electrical diagnostics,electron density,electron temperature,flat panel display manufacturing process,gas flow rate,high energy ion collision,in-line process characterization,optical diagnostics,partial local thermodynamic equilibrium model,remote plasma sources,semiconductor packaging,stable remote plasma region,surface analysis,thin film manufacturing process,voltage flow rate,
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