9.2: Fabrication techniques for a THz EIK

Richard Dobbs,Albert Roitman,Peter Horoyski,Mark Hyttinen, Dan Sweeney,D Chernin,M Blank,N Scott Barker,John H Booske,Edward Wright,J P Calame,Olga V Makarova

Vacuum Electronics Conference（2010）

引用 23|浏览25

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摘要

To produce an EIK working at THz frequencies, departure from traditional fabrication techniques is required. This paper describes the investigation and results of various fabrication techniques and their suitability for application in a VED.

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关键词

klystrons,ultraviolet lithography,eik,fabrication techniques,terahertz frequency,edm,micromachining,thz,uv lithography,x-ray lithography,circuits,machining,fabrication,electrodes,resists,frequency,power industry,x ray lithography

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