Design rule of nanostructures in light-emitting diodes for complete elimination of total internal reflection.

ADVANCED MATERIALS(2012)

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摘要
Cone-shaped nanostructures with controllable side-wall angle are success- fully fabricated with a SiO(2) nanosphere lithography (NSL) etching mask. Vertical LEDs with cone-shaped nanostructures with a 24.1° side-wall angle provide 6% more light output power compared to those using hexagonal pyramids formed by photochemical etching. This achievement is attributed to effective elimination of total internal reflection by angle-controlled nanostructures.
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关键词
total internal reflection,nanostructure,vertical-structure light-emitting diodes (V-LEDs),nanosphere lithography,finite-difference time-domain (FDTD)
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