Design, fabrication and characterization of the first dual-column 3D stripixel detectors

This paper presents design, fabrication and the first characterization of the new 3D stripixel detector. The device has dual-column electrodes (both n(+)- and p(+)-type) arranged in a quincunx configuration and processed in a single-sided process on n-type silicon bulk. Double-metal technology allows to connect the electrodes by two sets of perpendicular strips providing a X-Y projective read-out. The design of the sensor has been optimized with the use of TCAD Sentaurus simulations. TCT measurements were performed to study the active area of the detector. Finally, 2D position sensitivity was investigated reconstructing the position of a laser beam within a 80x80 mu m(2) pixel, defined by two neighbouring p(+)-type strips crossing two neighbouring n(+)-type strips.