Large-Aperture Plasma-Assisted Deposition of ICF Laser Coatings

Robert D Hand,A A Kozlov,D R Gibson, J B Oliver,Ian Brinkley,Semyon Papernov,Roman Chrzan,Ansgar W Schmid, A L Rigatti,Pete Kupinski,John C Lambropoulos,Frank Placido,Daniel Sadowski,John Spaulding

Optical Interference Coatings (2010), paper MB7（2010）

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摘要

Plasma-assisted electron-beam evaporation leads to changes in the crystallinity, density and stresses of thin films. A dual-source plasma system provides stress control of large-aperture, high-fluence coatings used in vacuum for substrates 1 m in aperture.

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