SiO2-metal cantilever structures under thermal and intrinsic stress

CAS 2011 Proceedings (2011 International Semiconductor Conference)（2011）

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摘要

The mechanical behavior of multi-layered cantilever structures made of SiO ₂ coated with thin metal films (chromium and gold) is investigated considering the intrinsic and thermal stress. Experimental measurements and numerical simulations were performed to analyze the influence of residual stress components on such cantilever structures.

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关键词

cantilever,silicon oxide,intrinsic stress,thermal stress,WLI characterization,FEM simulation

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