Cluster Ion Implantation for beyond 45nm node novel device applications
Masayasu Tanjyo,Tsutomu Nagayama,Nariaki Hamamoto,Sei Umisedo,Yuji Koga,N Maehara,Takao Matsumoto,Nobuo Nagai,Fumio Ootsuka,Akira Katakami,Kiyoshi Shirai,Toshinari Watanabe,Hiroyuki Nakata, M Kitajima,Takayuki Aoyama,T Eimori,Yasuo Nara,Yuzuru Ohji, Karuppanan Saker,Wade Krull, D C Jacobson,Thomas N Horsky EXTENDED ABSTRACTS 2008 INTERNATIONAL WORKSHOP ON JUNCTION TECHNOLOGY（2008）
关键词
annealing,stress,boron,ion implantation
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