Method of fabricating CMOS devices having a single work function gate electrode by band gap engineering and article made thereby Beenyih Jin,Robert S Chau,Brian S Doyle,Jack Kavalieros,Suman Datta,Mark L Doczy,Matthew V Metz,Justin K Braskmag(2007)引用 41|浏览3暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要