Silicon Nitride Layer Deposited at Low Temperature to Prevent Gate Dielectric Regrowth High-K Metal Gate Field Effect Transistors Anthony I Chou,Arvind Kumar,Shreesh Narasimha, C Ortolland, Kai Zhaomag(2015)引用 24|浏览9暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要