Development Of Molecular Resists Based On Phenyl[4] Calixarene Derivativesyy

We have developed negative-tone molecular resist based on C-4-cyclohexylphenylcalix[4] resorcinarene(MGR108) and positive-tone molecular resist based on protected C-4-isopropylphenylcalix[4] resorcinarene (MGR104P). Both MGR108 and MGR104P showed high solubility in both conventional resist solvents such as propylene glycol monomethyl ether and conventional alkaline developer of 0.26N TMAHaq. In this paper, we show current performance of resists by EB lithography (EBL) and EUV lithography (EUVL).