Structure to improve adhesion between top CVD low-k dielectric and dielectric capping layerLawrence A Clevenger, Stefanie Ruth Chiras,Timothy J Dalton,J Demarest,Derren N Dunn, C Dziobkowski,Philip L Flaitz,Michael Lane, J R Lloyd, D Restaino,T M Shaw,Yunyu Wang,Chihchao Yangmag(2008)引用 40|浏览3暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要