Nanoscale modulus and surface chemistry characterization for collapse free resists

On of the key challenges to high resolution resist pattern is pattern collapse. Using a new scanning probe microscopy (SPM), Peak Force (TM) tapping, we map nano-mechanical properties- modulus, adhesion, and dissipation- of the exposed/developed resist strucutres with sub-10 nm resolution. Properties are compared across a carbon based negative resist with and without cross-linking. The SPM technique reveals that cross-linking significantly enhanced the mechanical properties to give a champion resolution of sub 20 nm half-pitch in a chemically amplified negative resist system. Beyond mechanical properties, surface morphology and redistribution kinetics were examined using complementary techniques and reveal additional benefits with cross-lining.