5PM3-PMN-027 Characterization of Highly Oriented Magnetostrictive Films Deposited on Si MEMS Cantilever

Si micro-elecro-mechanicl-systems (MEMS) cantilevers were fabricated, on which Fe_<60>Pd_<40>, Fe_<86>Ga_<14> and Ni magnetostrictive films sputtered with various thicknesses. Dependence of film thickness (0.4-4.0μm) on crystal structure, film stress and magnetostriction was evaluated in detail, hi all magnetostrictive films, the crystalline structures had no dependence on the film thickness. The films were highly crystalline orientated. The FeGa/ Si, FePd/ Si and Ni/ Si cantilevers were initially deflected to 60 μm, 150μm and 150μm, respectively, due to the film stress. The FePd film had larger magnetstriction than the FeGa and Ni films. Magnetostrictions of 1μm, 0.4μm and 2μm FePd film were 60ppm, 50ppm and 50ppm, respectively. However, the magnetostriction decreased in 4μm-thickness, indicating that the optimal film thickness exists for generation of magnetostriction, hi the case of FeGa films, small magnetostriction of about 10ppm was observed in 4μm thick film. In the case of Ni films, magnetostrictions were about -20ppm in all thicknesses.