Contact Engineering For Nanocarbon Interconnects

Yusuke Abe,Anshul A Vyas,Richard Senegor,Patrick Wilhite,C Y Yang

2015 IEEE 15TH INTERNATIONAL CONFERENCE ON NANOTECHNOLOGY (IEEE-NANO)（2015）

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摘要

Electron-beam-induced deposited-tungsten (EBID-W) technique is used to fabricate contacts for carbon nanofiber (CNF) horizontal interconnect and carbon nanotube (CNT) vertical vias to improve the contact resistances at the nanocarbon-metal electrodes.

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关键词

nanocarbon, carbon nanotube, carbon nanofiber, interconnect, via, contact resistance

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