Particle adsorption behaviors during solvent cleaning containing NH4F
Microelectronic Engineering(2015)
摘要
•We clarified particle adsorption behaviors on metal lines during cleaning with a solvent containing NH4F.•EDX analysis detected metallic particles, and polymeric particles on the metal line after the solvent clean.•IPA rinse prevented the metallic particle adsorption, but it enhanced the polymeric particle adsorption.•Importance of a flow of liquid during rinsing was discussed.•Ionized Cu in an aqueous solution and electrically-charged polymeric particle could be adsorbed.
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关键词
Particle adsorption,Solvent cleaning,Cu
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