Computational simulations and parametric studies for directed self-assembly process development and solution of the inverse directed self-assembly problem

Approaches to the computational simulation of directed self-assembly (DSA) of block copolymers based on Monte-Carlo methods and self-consistent field theory are presented and reviewed, with an emphasis on computational models of DSA processes usable for fabrication of integrated circuits (ICs). Applications of such models are illustrated by presenting the results of simulations used in the development of DSA fabrication processes. The inverse DSA problem, or DSA proximity correction (DSA PC) problem, is formulated, and the methods for its computational solution are presented. The application of one of these methods is illustrated by demonstrating co-optimization of optical proximity correction (OPC) and DSA PC for IC vias fabricated using a graphoepitaxy DSA process. (C) 2014 The Japan Society of Applied Physics