Development of a high-performance gantry system for a new generation of optical slope measuring profilers

A new high-performance metrology gantry system has been developed within the scope of collaborative efforts of optics groups at the US Department of Energy synchrotron radiation facilities as well as the BESSY-II synchrotron at the Helmholtz Zentrum Berlin (Germany) and the participation of industrial vendors of x-ray optics and metrology instrumentation directed to create a new generation of optical slope measuring systems (OSMS) [1]. The slope measurement accuracy of the OSMS is expected to be <50nrad, which is strongly required for the current and future metrology of x-ray optics for the next generation of light sources.