Discrete relaxation method for contact layer decomposition of DSA with triple patterning
Integration, Volume 61, 2018, Pages 77-87.
Abstract Block copolymer directed self-assembly (DSA) is a simple and promising candidate next-generation device fabrication technology, which is low-cost as complement with multi-patterning for contact layer patterning. In this paper, we consider the contact layer mask and template assignment problem of DSA with triple patterning litho...More
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